X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1983-03-21
1985-08-13
Smith, Alfred E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378153, G01N 2320
Patent
active
045354693
ABSTRACT:
In an X-ray analysis apparatus, there is provided between a test specimen (5) or an analyzing crystal and a detector (9) a stray radiation slit (15) that can be adjusted in dependence on the goniometer angle. By an optimum adjustment of this slit in correspondence with the variation in the goniometer angle it can be achieved that the detector will always see the same portion of the surface of the test sample or analyzing crystal. Especially, the adjustment of the slit is coupled to the adjustment of an automatic divergence slit (11) so that the portion of the surface which is irradiated, remains unaltered. Especially for small goniometer angles, that is to say for the analysis of a substance in which there is a large distance between crystal planes, a considerably improved signal-to-noise ratio in the measurement signal is thus obtained.
REFERENCES:
patent: 2870337 (1959-01-01), Neff
patent: 3411000 (1968-11-01), Schliephake et al.
patent: 3852594 (1974-12-01), Paolini
patent: 3855469 (1974-12-01), Pluchery et al.
patent: 4412345 (1983-10-01), Workman et al.
Grigsby T. N.
Miller Paul R.
Smith Alfred E.
U.S. Philips Corporation
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