X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1990-01-29
1991-04-16
Westin, Edward P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 82, 378 83, 378 85, 378 45, 378 49, G01T 136, G21K 23201, G21K 106, G01N 23223
Patent
active
050089102
ABSTRACT:
An X-ray analysis apparatus comprises an analysis crystal which is cylindrically curved in the saggital direction. As a result, a beam diffracted by the crystal is collimated in that direction, i.e. the plane of incidence of the X-ray beam, so that a substantial gain regarding radiation yield is obtained without loss of resolution.
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Yaakohi et al., Focusing X-Ray Spectrograph for Laser Fusion Experiments, Rev. Sci. Instrum., 50(12), Dec. 1979, pp. 1609-1611.
Miller Paul R.
U.S. Philips Corporation
Westin Edward P.
Wong Don
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