X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1983-11-03
1986-01-28
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 82, G01N 2320
Patent
active
045676054
ABSTRACT:
In order to achieve high resolution in X-ray analysis, a monochromator comprising four crystals which are pair-wise positioned in parallel orientation is used with the two pairs being positioned in an offset anti-parallel orientation. An X-radiation source may be arranged in the immediate vicinity of the first crystal pair in order to achieve a high beam intensity. Each of the crystal pairs is preferably cut so as to form a U-shape from a single block of a monocrystalline material which is relatively free from dislocations. Germanium is a monocrystalline material of preferred use.
REFERENCES:
patent: 3518427 (1970-06-01), Cotterill
M. Hart, "Crystal Wavelength Calibrators for Synchrotron X-Ray Spectrometers" J. Phys. E: Sci. Instrum., vol. 12, 1979.
Church Craig E.
Miller Paul R.
U.S. Philips Corporation
Wieland Charles F.
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