X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2009-02-11
2009-11-24
Song, Hoon (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S058000, C378S086000
Reexamination Certificate
active
07623627
ABSTRACT:
Provided are an X-ray analysis apparatus and an X-ray analysis method, in which a measurer can judge an area incapable of being analyzed in a sample with a concave-convex portion. The X-ray analysis apparatus includes: an X-ray tubular bulb for irradiating an arbitrary irradiation point located on the sample with a radiation beam; an X-ray detector for detecting a characteristic X-ray and a scattered X-ray radiated from the sample and outputting a signal containing energy information on the characteristic X-ray and the scattered X-ray; a narrow-range illumination mechanism and a wide-range illumination mechanism for emitting an illumination light to the sample to illuminate the sample; and a narrow-range observation mechanism and a wide-range observation mechanism for obtaining an illumination image of the sample, which is illuminated with the illumination light, as image data, in which the narrow-range observation mechanism and the wide-range observation mechanism include a narrow-range oblique illumination section and a wide-range oblique illumination section, respectively, in which an optical axis of the illumination light at a time of the illuminating is set toward the irradiation point in the same direction as a direction linking the irradiation point with the X-ray detector at a time of the detecting.
REFERENCES:
patent: 7492863 (2009-02-01), Harding
patent: 2009/0147920 (2009-06-01), Barty et al.
patent: 2007-292476 (2007-11-01), None
Brinks Hofer Gilson & Lione
SII NanoTechnology Inc.
Song Hoon
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