X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1992-12-18
1995-08-01
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 83, G01T 136
Patent
active
054386136
ABSTRACT:
An X-ray analysis apparatus includes a scanning unit (1) with an X-ray source (3), a crystal holder (9) and an X-ray detection system (5) provided with an X-ray detector (7). The crystal holer (9) can be rectilinearly displaced in a fixed radiation pick-up direction (35) relative to the X-ray source (3). The crystal holder (9) and the X-ray detector (7) are mechanically coupled to one another via a plate (21) which can be driven by means of a motion mechanism. The X-ray source (3), the X-ray detector (7) and the crystal holder (9) remain positioned on a Rowland circle (11) during the displacement. The motion mechanism has a first guide (23) and a second guide (25). The drive direction of the first guide (23) encloses an acute angle .alpha. relative to the fixed pick-up direction (35).
REFERENCES:
patent: 3123710 (1964-03-01), Neuhaus
patent: 4637041 (1987-01-01), Brinkgreve et al.
Gijzen Wilhelmus A. H.
Van Alen Johannes P. M.
Van Egeraat Walterus A. L. A.
Visscher Albert
Church Craig E.
Slobod Jack D.
U.S. Philips Corporation
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