X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2006-12-05
2006-12-05
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S070000, C378S081000, C378S098800
Reexamination Certificate
active
07145983
ABSTRACT:
An X-ray analysis apparatus is disclosed, in which X-rays emitted from an X-ray source are applied to a sample and a two-dimensional CCD sensor detects the X-rays diffracted by the sample. The X-ray analysis apparatus has a 2θ-rotation drive and a program. The 2θ-rotation drive moves the two-dimensional CCD sensor. The program is executed to control the motion of the CCD sensor. The 2θ-rotation drive rotates the CCD sensor around ω-axis that extends over the surface of the sample. The program synchronizes the transfer of charges in the CCD sensor with the motion of the CCD sensor driven by the 2θ-rotation drive. Hence, data items for the same diffraction angle can be accumulated in the pixels of the two-dimensional CCD sensor. This achieves high-speed and high-sensitivity in detection of diffracted X-rays.
REFERENCES:
patent: 5742658 (1998-04-01), Tiffin et al.
patent: 6198796 (2001-03-01), Yokoyama et al.
patent: 2002/0053641 (2002-05-01), Verbruggen
patent: 2005/0084065 (2005-04-01), Taguchi
patent: 0 997 779 (2000-05-01), None
patent: 2002-250705 (2002-09-01), None
Taguchi Takeyoshi
Tajima Takeo
Buchanan & Ingersoll & Rooney PC
Rigaku Corporation
Yun Jurie
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