X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1993-04-09
1995-04-11
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 45, 378 84, 378 83, G21K 106
Patent
active
054066093
ABSTRACT:
An X-ray analysis apparatus including an artificial multi-layered grating for rendering X-ray beams to be monochromatic before they are incident on a specimen to be analyzed. This artificial multi-layered grating operates to diffract the X-ray beam, generated from an X-ray radiation source and subsequently impinging on a reflective surface of the artificial multi-layered grating, at a predetermined angle of diffraction to provide the monochromatic X-ray beams. The periodicity of the spacing of lattice planes of the artificial multi-layered grating is so chosen as to be of a value progressively varying along the reflective surface thereof with an increase in distance from the X-ray radiation source. The X-ray analysis apparatus herein disclosed is designed to avoid any possible reduction of the intensity of the X-ray beams which would occur when they are rendered to be monochromatic, and to increase the intensity of the X-ray beams to ensure an improved accuracy in spectroscopic analysis.
REFERENCES:
patent: 4916721 (1990-04-01), Carr et al.
"New method for focusing x rays and gamma rays" R. K. Smither, Rev. Sci. Instrum. 53(2), Feb. 1982, pp. 131-141.
Arai Tomoya
Shoji Takashi
Church Craig E.
Rigaku Industrial Corporation
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