X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1986-10-20
1989-01-24
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 83, 378 84, 25037001, G01N 2320
Patent
active
048005800
ABSTRACT:
In an X-ray analysis apparatus provided with a detector comprising photodiode-detection elements, it is possible to eliminate the dark current and the background current from the measurement signals due to the fact that elements in the signal reading device can be combined. Due to the fact that also during the measurement at a stationary peak beside the signal amplitude also signal ratios can be obtained from combinations of detector elements, the correct position and amplitude of the peaks to be measured can be determined. The detector can also be provided with mutually separated detector elements which have such a surface area and configuration that the dark surrent can already be compensated thereby.
REFERENCES:
patent: 3663812 (1972-05-01), Koenig
patent: 3852594 (1974-12-01), Paolini
patent: 3896313 (1975-07-01), Berman et al.
patent: 3934138 (1976-01-01), Bens
patent: 3973128 (1976-08-01), Le May
patent: 4066900 (1978-01-01), Le May
patent: 4131794 (1978-12-01), Bruninx
patent: 4504962 (1985-03-01), Moore
Dierker et al., "Image Intensifier Gamma Camera with a Position-Sensitive Silicon Stripe Detector", Siemens Forsch-U. Entwickl.-Ber. Bd. 6 (1977), Nr. 4.
Brouwer Geert
Houtman Eliberthus
Church Craig E.
Freeman John C.
Miller Paul R.
U.S. Philips Corporation
LandOfFree
X-ray analysis apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with X-ray analysis apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray analysis apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-423620