Write head with high moment film layer having tapered...

Dynamic magnetic information storage or retrieval – Head – Core

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

06873494

ABSTRACT:
An inductive write head structure incorporating a high moment film in conjunction with at least one pole (e.g., the bottom pole) for use with magnetic storage media and a process for producing the same in which a lift-off photoresist mask is used prior to the deposition of the high moment sputtered film. Following the lift-off process, the high moment film remains on the bottom pole (“P1”) pedestal (in the case of a PDZT type write head) or on the P1itself (in the case of a Stitched Pole write head). The edge of the lift-off sputtered film is then covered by cured photoresist insulation which is placed at a distance away from the air bearing surface (“ABS”). The coverage of insulation at the edge of the sputtered film is desirable in order to avoid forming a topographic step which may have undesired consequences in the subsequent top pole formation processes.

REFERENCES:
patent: 4589042 (1986-05-01), Anderson et al.
patent: 5639509 (1997-06-01), Schemmel
patent: 5751526 (1998-05-01), Schemmel
patent: 5828533 (1998-10-01), Ohashi et al.
patent: 6032353 (2000-03-01), Hiner et al.
patent: 6172848 (2001-01-01), Santini
patent: 6317290 (2001-11-01), Wang et al.
patent: 6369984 (2002-04-01), Sato
patent: 6430806 (2002-08-01), Chen et al.
patent: 6452743 (2002-09-01), Sasaki
patent: 6469875 (2002-10-01), Chen et al.
patent: 6525902 (2003-02-01), Hu et al.
patent: 6525905 (2003-02-01), Sasaki
patent: 6618223 (2003-09-01), Chen et al.
patent: 20020024776 (2002-02-01), Sasaki et al.
patent: 20020067570 (2002-06-01), Sasaki et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Write head with high moment film layer having tapered... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Write head with high moment film layer having tapered..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Write head with high moment film layer having tapered... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3455075

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.