Workpiece processor having processing chamber with improved...

Chemistry: electrical and wave energy – Apparatus – Electrolytic

Reexamination Certificate

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Details

C204S212000, C204S242000, C204S260000, C204S263000, C204S275100, C204S287000, C205S123000, C205S291000

Reexamination Certificate

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10400186

ABSTRACT:
A processing container (610) for providing a flow of a processing fluid during immersion processing of at least one surface of a microelectronic workpiece is set forth. The processing container comprises a principal fluid flow chamber (505) providing a flow of processing fluid to at least one surface of the workpiece and a plurality of nozzles (535) disposed to provide a flow of processing fluid to the principal fluid flow chamber. The plurality of nozzles are arranged and directed to provide vertical and radial fluid flow components that combine to generate a substantially uniform normal flow component radially across the surface of the workpiece. An exemplary apparatus using such a processing container is also set forth that is particularly adapted to carry out an electroplating process. In accordance with a further aspect of the present disclosure, an improved fluid removal path (640) is provided for removing fluid from a principal fluid flow chamber during immersion processing of a microelectronic workpiece.

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