Workpiece lifting and holding apparatus

Details Workpiece lifting and holding apparatus Workpiece lifting and holding apparatus

1985-08-05

1986-05-13

Sheridan, Robert G.

Material or article handling

Apparatus for moving material between zones having different...

Including serially arranged valves in path having a vertical...

414222, H01J 502

Patent

active

045883432

ABSTRACT:
An automatic sputtering apparatus for coating semiconductor wafers uses shuttle wafer carriers and elevators to handle wafers within the apparatus. The wafer carrier has a hole in the center. One side of the wafer carrier is opened, thereby forming a throat in the shuttle wafer carrier in the form of the letter C. The elevator has a cantilevered shaft. The upper part of the shaft of the elevator is centered under the wafer while the lowest part of the cantilevered shaft is under a point outside the wafer carrier. The connecting portion of the shaft passes through the throat of the wafer carrier as the wafer is lifted. Since the lifting portion of the shaft is outside the wafer carrier, the shuttle can move with the elevator in the up position. The pedestal for holding the wafer on the elevator is equipped with arms which project upward at an angle to the horizontal, thereby confining the wafer to a pedestal.

REFERENCES:
patent: 3973665 (1976-08-01), Giammanco
patent: 4388034 (1983-06-01), Takahashi

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