Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1978-09-21
1980-09-16
Mack, John H.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204298, 156345, 156643, C23F 100, B01K 100
Patent
active
042228395
ABSTRACT:
A holder and method for controlling and uniformly maintaining the temperature of work pieces when the work pieces are acted upon by a plasma in a plasma reactor apparatus. Support means which hold the work pieces so as to expose them to the reactive plasma also position metallic plate members which are capable of being heated to an elevated temperature by the plasma when in electrical contact with an electrode of the plasma reactor apparatus. The metallic plate members are all electrically shorted together, but are insulated from the support means. A temperature sensitive switch connects the metallic plate members to an electrode of the plasma apparatus. Work pieces to be acted upon by the plasma are placed in proximity to the metal plate members. In the presence of a plasma and when shorted to the apparatus electrode, the metallic plate members are rapidly heated and heat is conducted to the work pieces to heat them uniformly. The temperature of the work pieces is controlled by selectively opening and closing the temperature sensitive switch and thereby selectively shorting the metal members to the apparatus electrode. Little heating occurs when the switch is open and the members are isolated from the electrode.
REFERENCES:
patent: 3573190 (1971-03-01), Bloom
patent: 3780255 (1973-12-01), Boom
patent: 4115184 (1978-09-01), Poulsen
patent: 4141811 (1979-02-01), Yerkes et al.
H. M. Gartner et al., In Situ Thermal Control/Monitor System for Reactive Ion Etch Process, IBM Technical Disclosure Bulletin vol. 20 No. 3 (8/77) p. 994
Goodner Willis R.
Kao Joseph P. Y.
Fisher John A.
Leader William
Mack John H.
Motorola Inc.
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