Work supplying method and apparatus to batch process apparatus f

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36446807, 36446808, 36446828, G06F 1900

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active

059301376

ABSTRACT:
The invention provides a work supply method and apparatus for a batch process apparatus for semiconductor wafers by which works having a comparatively severe delivery date are processed preferentially. A processing end time calculation section of a batch formation control section refers to a history file in response to a processing start report from a batch process apparatus to predict a processing end time. A work extraction section refers to a step management file to extract those of the works which can arrive at a batch process apparatus on or prior to the thus predicted processing end time. A batch formation section forms, designating the extracted works as an object of batch formation, the works into a batch such that one of the works which has the highest preferential degree is designated as a top work of the batch. A transport section transports the works of the batch collectively to the batch process apparatus.

REFERENCES:
patent: 5148370 (1992-09-01), Litt et al.
patent: 5282139 (1994-01-01), Kobayashi
patent: 5351195 (1994-09-01), Sherman
patent: 5359524 (1994-10-01), Rohan
patent: 5465534 (1995-11-01), Hirosawa et al.
patent: 5696689 (1997-12-01), Okumura
patent: 5737228 (1998-04-01), Ishizuka et al.
patent: 5745364 (1998-04-01), Togasui

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