Wire loop and method of forming the wire loop

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Metallic housing or support

Reexamination Certificate

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C438S612000, C438S617000, C257SE21509

Reexamination Certificate

active

08048720

ABSTRACT:
A method of forming a wire loop is provided. The method includes: (1) forming a first fold of wire; (2) bonding the first fold of wire to a first bonding location to form a first bond; (3) extending a length of wire, continuous with the first bond, between (a) the first bond and (b) a second bonding location; and (4) bonding a portion of the wire to the second bonding location to form a second bond.

REFERENCES:
patent: 4230925 (1980-10-01), Lascelles
patent: 5945065 (1999-08-01), Kikuchi et al.
patent: 6715666 (2004-04-01), Imai et al.
patent: 6815836 (2004-11-01), Ano
patent: 6933608 (2005-08-01), Fujisawa
patent: 7188759 (2007-03-01), Calpito et al.
patent: 7347352 (2008-03-01), Qin et al.
patent: 2005/0072833 (2005-04-01), Wong et al.
patent: 2005/0189567 (2005-09-01), Fujisawa
patent: 2006/0163331 (2006-07-01), Babinetz
patent: 2006/0175383 (2006-08-01), Mii et al.
patent: 2006/0255101 (2006-11-01), Shirato et al.
patent: 7183303 (1995-07-01), None
patent: 09051011 (1997-02-01), None
patent: 10-2007-0088489 (2007-08-01), None
International Search Report dated Oct. 24, 2008, for International Application No. PCT/US2008/052378.

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