Wipe-off apparatus of liquid phase epitaxy of mercury cadmium te

Details Wipe-off apparatus of liquid phase epitaxy of mercury cadmium te Wipe-off apparatus of liquid phase epitaxy of mercury cadmium te

1986-06-09

1987-11-17

McIntosh, John P.

Coating apparatus

Immersion or work-confined pool type

Work-confined pool

118421, H01L 21208

Patent

active

047066040

ABSTRACT:
In a covered graphite slider apparatus for the liquid phase epitaxial growth of mercury cadmium telluride, this invention shows the addition of an improved wipe-off arrangement positioned in tandem with the CdTe substrate upon which the HgCdTe epitaxial layer is grown. This arrangement includes the providing of a discardable CdTe drainage apron adjacent the substrate for preventing residual growth solution from migrating back onto the substrate which has just been wiped-off by the LPE slider.

REFERENCES:
patent: 3747562 (1973-07-01), Stone et al.
patent: 3890194 (1975-06-01), Ettenberg
patent: 4317689 (1982-03-01), Bowers et al.
patent: 4366771 (1981-01-01), Bowers et al.
patent: 4592304 (1986-06-01), Hager et al.

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