Wide area soft vacuum abnormal glow electron beam discharge hard

Details Wide area soft vacuum abnormal glow electron beam discharge hard Wide area soft vacuum abnormal glow electron beam discharge hard

1988-11-17

1990-02-27

Howell, Janice A.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504923, 250423R, H01J 3730

Patent

active

049048660

ABSTRACT:
A process for large area hardening of photoresists or polymer films placed on substrates is disclosed. The process requires the use of a short duration (<1 us.) pulsed electron beam produced in soft vacuum by an abnormal glow discharge. The pulsed electron beam interacts with the patterned photoresist/polymer resist so as to harden or stabilize the patterns thereon by electron induced cross-linking. The use of a soft vacuum environment allows for both thermal as well as chemically induced hardening.

REFERENCES:
patent: 4187331 (1980-02-01), Hsioh-Lien Ma
patent: 4496449 (1985-01-01), Rocca et al.
patent: 4527044 (1985-07-01), Bruel et al.
patent: 4737688 (1988-04-01), Collins et al.
patent: 4827137 (1989-05-01), Collins et al.
patent: 4849628 (1989-07-01), McLuckey et al.

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