Wide area radio frequency plasma apparatus for processing...

Details Wide area radio frequency plasma apparatus for processing... Wide area radio frequency plasma apparatus for processing...

2006-12-06

2010-12-07

Hassanzadeh, Parviz (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C118S7230IR, C118S7230AN, C118S728000, C118S729000, C118S730000, C156S345480, C156S345510, C156S345520, C156S345530, C156S345540, C156S345550, C315S111210, C315S111510

Reexamination Certificate

active

07845310

ABSTRACT:
An antenna array for a radio frequency plasma process chamber including, an array of electrodes, an array of dielectric tubes concentrically disposed about each electrode tube to define a chamber configured to be at atmospheric pressure between an outer surface of each electrode tube and an inner surface of the corresponding dielectric tube, and a hermetic seal between each dielectric tube and the plasma process chamber configured to allow a vacuum or low pressure in the plasma process chamber.

REFERENCES:
patent: 5368710 (1994-11-01), Chen et al.
patent: 5434353 (1995-07-01), Kraus
patent: 6136165 (2000-10-01), Moslehi
patent: 6181069 (2001-01-01), Tonotani et al.
patent: 6811757 (2004-11-01), Niv et al.
patent: 2003/0168172 (2003-09-01), Glukhoy
patent: 2005/0098117 (2005-05-01), DiVergilio et al.
patent: 2006/0049138 (2006-03-01), Miyake et al.
patent: 2007/0144440 (2007-06-01), Yoneda et al.

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