Wholly aromatic polyamide resin composition having enhanced ligh

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Processes of preparing a desired or intentional composition...

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524 94, 524105, 524220, C08K 53417

Patent

active

053128516

ABSTRACT:
A light-resistant wholly aromatic polyamide resin composition comprises a light-resisting agent blended to a wholly aromatic polyamide resin and comprising at least one naphthalene ring structure-containing compound of the formula (I): ##STR1## wherein Ar.sub.1, Ar.sub.2, Ar.sub.3 =a divalent organic group, X=an amide bond group (--CONH), Y=an amide bond group or an imide bond group ##STR2## A and B=a monovalent organic group when Y=an amide bond group, or =a divalent organic group when Y=an imide bond group, n=1 to 10, and at least one of Ar.sub.1, Ar.sub.2, Ar.sub.3, A and B has a naphthalene ring structure.

REFERENCES:
patent: 3340225 (1967-09-01), Dressler et al.
patent: 3574230 (1971-04-01), Cyba
patent: 4431762 (1984-02-01), Araki et al.
patent: 4783367 (1988-11-01), Maatman
Chemical Patents Index, Documentation Abstracts Journal Derwent Publications Ltd, London, GB 93-061703/08.

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