Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1975-11-21
1977-07-19
Edmundson, F.C.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204199, 204224R, C25D 1700
Patent
active
040367258
ABSTRACT:
A selective jet plating system having a plurality of stationary, plating jets and a pair of split concentric annular rotatable members for continuously plating metal on a metal strip is described. The rotatable members are provided for transporting the metal strip continuously past the jets. The fluid jets are spaced in a circle interior of the annular members for jetting plating fluid radially outwardly through an adjustable slot between the annular members against the strip as the strip is transported by the annular members past the jets. Also provided is a plurality of cathode electrodes which are provided at spaced locations along the path of travel and in sliding contact with the strip. The jets are made of a fluid-compatible metallic material for forming an anode. A back-up belt is also provided for providing a back-up for the strip to prevent fluid loss through the strip if the strip has holes in it. The annular members are further provided to be adjustable relative to each other and to the strip for adjusting the width and position of the plating deposited on the strip.
REFERENCES:
patent: 3640854 (1972-08-01), Klein
patent: 3819502 (1974-06-01), Meuldijk et al.
patent: 3855108 (1974-12-01), Bolz et al.
Allen Robert M.
Seyffert Michael
Edmundson F.C.
Higgins Willis E.
National Semiconductor Corporation
Woodward Gail W.
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