Wettable carrier in gas drying system for wafers

Details Wettable carrier in gas drying system for wafers Wettable carrier in gas drying system for wafers

1980-06-23

1982-03-09

Fisher, Richard V.

Cleaning and liquid contact with solids

Processes

Work handled in bulk or groups

134 30, 134 32, 134 37, 211 41, 34 22, 34 34, 34218, 34231, B08B 310, B08B 1300

Patent

active

043187498

ABSTRACT:
A gas drying system for use in removing a liquid from a substrate comprises a carrier adapted to support the substrate wherein the parts of the carrier that make contact with the substrate have a surface wettable by the liquid and the wettable surface has a roughened surface of a material that is capable of being hydroxylated, and a dryer for exposing the substrate to a stream of ambient-temperature gas.

REFERENCES:
patent: 3534862 (1970-10-01), Shambelan
patent: 3678893 (1972-07-01), Bell
patent: 3826377 (1974-07-01), Bachmann
patent: 3828726 (1974-08-01), Dietze et al.
patent: 3893869 (1975-07-01), Mayer et al.
patent: 3926305 (1975-12-01), Wallestad

Affiliated with

Also associated with

Rating

Wettable carrier in gas drying system for wafers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wettable carrier in gas drying system for wafers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wettable carrier in gas drying system for wafers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1839243