Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer
Reexamination Certificate
2003-06-30
2010-02-02
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaged product
Including resin or synthetic polymer
C430S009000, C430S270100, C430S271100, C430S311000, C430S315000, C430S321000, C430S905000
Reexamination Certificate
active
07655365
ABSTRACT:
It is a main object of the present invention to provide a wettability variable substrate provided with a wettability variable layer which is free from any cloud and is superior in adhesion to a substrate, transparency and liquid repellency. The above object is attained by the provision of a wettability variable substrate comprising a wettability variable layer, on a substrate, which the wettability is varied by exposing to light in the presence of a photocatalyst,wherein the wettability variable layer contains an organopolysiloxane which is a co-hydrolysis condensation polymer obtained using (A) one type or two or more types of organopolysiloxane precursors represented by YnSiX(4-n)(Y represents an alkyl group or a fluoroalkyl group, or a substituent containing these groups, X represents an alkoxyl group, an acetyl group or a halogen, a letter n subscripted to Y and a letter n in (4-n) subscripted to X are an integer from 1 to 3), and (B) an amorphous silica precursor represented by SiX4(X is the same as above) by a mass ratio of (A)/(B)=1/0.1 to 1/20.
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Machine-assisted English translation of JP 2002-139615, provided by JPO.
Kobayashi Hironori
Yamashita Kaori
Dai Nippon Printing Co. Ltd.
Ladas & Parry LLP
Lee Sin J.
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