Wet-tantalum reformation method and apparatus

Surgery: light – thermal – and electrical application – Light – thermal – and electrical application – Electrical therapeutic systems

Reexamination Certificate

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Reexamination Certificate

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08036740

ABSTRACT:
A method of reforming a wet-tantalum capacitor includes providing a medical device comprising a wet-tantalum capacitor. The capacitor has a rated voltage and including a hydrated anodic deposit. The method further includes charging the capacitor to a voltage that is less than approximately seventy-five percent of the rated voltage and at least partially discharging the capacitor after the charging step. The charging step is performed at a sufficient voltage to dehydrate the anodic deposit while not significantly decreasing the service life of the capacitor.

REFERENCES:
patent: 2965690 (1960-12-01), Petersen et al.
patent: 3684947 (1972-08-01), Evalds et al.
patent: 3850764 (1974-11-01), Herczog et al.
patent: 4645533 (1987-02-01), Izumi
patent: 4693253 (1987-09-01), Adams
patent: 4780797 (1988-10-01), Libby
patent: 4830006 (1989-05-01), Haluska et al.
patent: 4942500 (1990-07-01), Libby et al.
patent: 4971058 (1990-11-01), Press et al.
patent: 5043849 (1991-08-01), Libby
patent: 5098485 (1992-03-01), Evans
patent: 5265588 (1993-11-01), Nelson et al.
patent: 5312439 (1994-05-01), Loeb
patent: 5312441 (1994-05-01), Mader et al.
patent: 5369547 (1994-11-01), Evans
patent: 5469325 (1995-11-01), Evans
patent: 5559667 (1996-09-01), Evans
patent: 5737181 (1998-04-01), Evans
patent: 5754394 (1998-05-01), Evans et al.
patent: 5827326 (1998-10-01), Kroll et al.
patent: 5851506 (1998-12-01), Zheng et al.
patent: 5861006 (1999-01-01), Kroll
patent: 5894403 (1999-04-01), Shah et al.
patent: 5899923 (1999-05-01), Kroll et al.
patent: 5982609 (1999-11-01), Evans
patent: 5999852 (1999-12-01), Elabbady et al.
patent: 6005370 (1999-12-01), Gustavson et al.
patent: 6094597 (2000-07-01), Wold
patent: 6096062 (2000-08-01), Silvian
patent: 6136176 (2000-10-01), Wheeler et al.
patent: 6208502 (2001-03-01), Hudis et al.
patent: 6283985 (2001-09-01), Harguth et al.
patent: 7131988 (2006-11-01), Harguth et al.
patent: 2001/0047190 (2001-11-01), Harguth et al.
patent: 2002/0095186 (2002-07-01), Harguth et al.
patent: 2003/0088273 (2003-05-01), Liu et al.
patent: 2003/0090857 (2003-05-01), Liu et al.
patent: 198 36 651 (2000-02-01), None
patent: 1 312 390 (2003-05-01), None
patent: WO 00/02213 (2000-01-01), None
patent: WO 01/73801 (2001-10-01), None
patent: WO 2004/102639 (2004-11-01), None
B.E. Conway, “Electrochemical Supercapacitors”, 58 pages, Kluwer Academic Publishers (1999).
G.E. Loeb, C.J. Zamin, J.H. Schulman, P.R. Troyk Injectable microstimulator for functional electrical stimulation, 7 pages, Med. & Biol. Eng. & Comput., 29, NSI3-NS19 (1991).
I. D. Raistrick, “Electrochemical capacitors”, in “Electrochemistry of semiconductors and electronics—processes and devices”, 30 pages, eds: John McHardy and Frank Ludwig, Noyes Publications(1992).
S. Trasatti (ed), “Electrodes of conductive metallic oxides”, part A, 59 pages, Elesevier (1980).
S. Trasatti, G. Buzzanca, “Ruthenium dioxide: a new and interesting electrode material. Solid state structure and electrochemical behavior,” 5 pages, Journal of Electroanalytical Chemistry and Interfacial Electrochemistry, 29, App. 1-5, (1971).
PCT International Search Report based on PCT/US2004/014037, date of mailing of the International Search Report—Sep. 11, 2004, 4 total pgs.
Office Action for U.S. Appl. No. 10/431,356, mail date Oct. 19, 2005, 7 pages.
Office Action for U.S. Appl. No. 10/431,356, mail date May 16, 2006, 8 pages.
Office Action for U.S. Appl. No. 10/431,356, mail date Jan. 22, 2007, 12 pages.
Office Action for U.S. Appl. No. 10/431,356, mail date Dec. 28, 2007, 7 pages.
Office Action for U.S. Appl. No. 10/431,356, mail date Jul. 29, 2008, 8 pages.
Office Action for U.S. Appl. No. 10/431,356, mail date Feb. 3, 2009, 8 pages.
Office Action for U.S. Appl. No. 10/431,356, mail date Sep. 8, 2009, 8 pages.
Written Opinion for PCT/US2004/014037, mail date Jan. 12, 2004, 6 pages.
Translation of the reasoning of Official Action for Japanese Patent Application 2006-532797, dated Feb. 19, 2010, 2 pages.
Communication pursuant to Article 94(3) EPC for Application No. 04 751 431.0-2214, dated Dec. 14, 2009, 5 pages.
Amendment and Reply for U.S. Appl. No. 10/431,356, Jan. 19, 2006, 15 pages.
Amendment and Reply for U.S. Appl. No. 10/431,356, Sep. 18, 2006, 11 pages.
Request for Continued Examination for U.S. Appl. No. 10/431,356, Oct. 10, 2006, 4 pages.
Amendment for U.S. Appl. No. 10/431,356, Jul. 23, 2007, 8 pages.
Office Action for U.S. Appl. No. 10/431,356, mail date Sep. 27, 2007, 9 pages.
Amendment and Reply for U.S. Appl. No. 10/431,356, Oct. 26, 2007, 5 pages.
Request for Continued Examination for U.S. Appl. No. 10/431,356, Oct. 30, 2007, 4 pages.
Amendment and Reply for U.S. Appl. No. 10/431,356, Apr. 25, 2008, 10 pages.
Amendment and Reply for U.S. Appl. No. 10/431,356, Dec. 1, 2008, 15 pages.
Amendment and Reply for U.S. Appl. No. 10/431,356, Jun. 3, 2009, 18 pages.
Amendment and Reply for U.S. Appl. No. 10/431,356, Dec. 4, 2009, 17 pages.
Request for Continued Examination for U.S. Appl. No. 10/431,356, Dec. 28, 2009, 4 pages.
Office Action for U.S. Appl. No. 10/431,356, mail date Sep. 7, 2010, 5 pages.
Amendment and Reply for U.S. Appl. No. 10/431,356, Oct. 4, 2010, 9 pages.
Notice of Allowance for U.S. Appl. No. 10/431,356, mail date Nov. 18, 2010, 6 pages.
PCT International Preliminary Report on Patentability and Written Opinion based on PCT/US2004/014037, mail date Nov. 24, 2005, 7 pages.
PCT International Search Report for PCT/US2004/014037, mail date Jan. 27, 2005, 6 pages.
Response to European Application No. 04751431.0, Jun. 23, 2010, 4 pages.
Response to Office Action for Japanese Patent Application No. 2006-532797, Aug. 19, 2010, 4 pages.

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