Wet station, and method of and apparatus for wet cleaning using

Details Wet station, and method of and apparatus for wet cleaning using Wet station, and method of and apparatus for wet cleaning using

1995-11-06

1998-09-15

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134109, 134111, 134902, B08B 1500

Patent

active

058065431

ABSTRACT:
A wet station, a wet cleaning method and a wet cleaning apparatus are provided, in which throughput of ultrapure rinse is high, and chemicals and ultrapure water can be regenerated and reused.
The wet station is characterized in that a filter made of polytetrafluoroethylene is installed in a ceiling of a wet bench, inside of which wet process apparatuses are provided, and that a spray shower device having a finely-porous nozzle is installed in an upper space between a chemical bath and an ultrapure water rinse bath, both being located inside said wet bench. Furthermore, the wet cleaning method is characterized in that a substrate to which chemicals are attached is cleaned by using ultrapure water or ozonized ultrapure water, and that ultrapure water after said cleaning is collected and made to flow into dedicated piping so that said ultrapure water after said cleaning can be fractionally recovered. Furthermore, the wet cleaning apparatus is characterized in that, for the purpose of fractional recovery of ultrapure water after said cleaning, a collector for collecting ultrapure water and dedicated piping are provided.

REFERENCES:
patent: 4520834 (1985-06-01), DiCicco
patent: 5190064 (1993-03-01), Aigo
patent: 5265632 (1993-11-01), Nishi
patent: 5299584 (1994-04-01), Miyazaki et al.
patent: 5445171 (1995-08-01), Ohmori et al.
patent: 5507847 (1996-04-01), George
EPO 497,247 (EPO '247) Aug. 1992.

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