Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Patent
1996-06-14
1998-09-08
Powell, William
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
156345, 216 93, 438753, H01L 2100
Patent
active
058045163
ABSTRACT:
In accordance with the present invention, a wet bench processing apparatus equipped with a rapid drain and rinse system is provided. The system stores reserved liquids and air pressure during normal operation for use during a situation where a power or mechanical failure may occur. When such a failure occurs, a controller unit, which is connected to an uninterrupted power supply or other types of energy storage devices, provides an electrical control signal to a solenoid actuated valve. The solenoid actuated valve receives a pneumatic input that is received from a pressurized air reservoir. When the electrical signal is received by the solenoid actuated valve, the reserved pneumatic pressure is released to operate one or more valves. A reservoir of rinse fluid is provided such that when one of the valves is activated by the solenoid actuated valve, gravity forces rinse fluid through the valve and into the tank to remove the chemicals from the wafers.
REFERENCES:
patent: 4822441 (1989-04-01), Ohta et al.
patent: 5571367 (1996-11-01), Nakajim et al.
Hsu Y. M.
Pang C. J.
Powell William
Taiwan Semiconductor Manufacturing Co. Ltd.
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