Wet processing device and wet processing method

Cleaning and liquid contact with solids – Apparatus – With plural means for supplying or applying different fluids...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C134S198000, C134S902000

Reexamination Certificate

active

07431038

ABSTRACT:
The flow of a processing liquid poured onto the surface of a substrate at a standstill to process the substrate from the surface to the back surface of the substrate is suppressed to achieve satisfactory cleaning.When a processing liquid is poured onto a substrate held in a horizontal position by a substrate holding unit to carryout a predetermined process, for example, a cleaning liquid is discharged through a discharge opening corresponding to the entire circumference of the back surface of the substrate before pouring the processing liquid onto the surface of the substrate, and the cleaning liquid discharged on the back surface of the substrate and a liquid flowing from the surface to the back surface of the substrate are sucked through a suction opening corresponding to the entire circumference of the back surface of the substrate and included in a first suction means. Thus an outward flow of the cleaning liquid is produced on the back surface of the substrate. For example, the flow of the liquid from the surface to the back surface of the substrate can be suppressed without resorting to a shake-off action resulting from rotation and, consequently, the substrate can be satisfactorily cleaned.

REFERENCES:
patent: 2001/0037858 (2001-11-01), Taniyama
patent: 2002/0195128 (2002-12-01), Shibagaki
patent: 2903284 (1999-03-01), None
patent: 3198377 (2001-06-01), None
patent: 2001-319849 (2001-11-01), None
patent: 2003-007664 (2003-01-01), None
patent: 2004-022783 (2004-01-01), None
Notification of Transmittal of Copies of Translation of the International Preliminary Report on Patentability (Form PCT/IB/338)—PCT/JP2005/006260, dated Jan. 2004.
PCT International Preliminary Report on Patentability (Form PCT/IB/373)—PCT/JP2005/006260, dated Jan. 2004.
Translation of PCT Written Opinion of the International Searching Authority—(Form PCT/ISA/237)—PCT/JP2005/006260, dated Jan. 2004.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Wet processing device and wet processing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wet processing device and wet processing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wet processing device and wet processing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4002312

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.