Wet-processing apparatus, wet-processing method and storage...

Details Wet-processing apparatus, wet-processing method and storage... Wet-processing apparatus, wet-processing method and storage...

2007-09-12

2011-11-15

Laballe, Clayton E (Department: 2862)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

Reexamination Certificate

active

08057114

ABSTRACT:
A wet-processing apparatus includes module groups each including plural processing modules and a shared nozzle device to be used in common by the processing module of the module group. The wet-processing apparatus includes plural processing modules not less than four processing modules, for example, six processing modules. The six processing modules are divided into two module groups, namely, first and second module groups each of the three processing modules. Each of the first and the second module group is provided with a nozzle device for pouring a processing solution onto a wafer. The first wafer is delivered to the first processing module, the second wafer is delivered to the processing module of the second module group, the third wafer is delivered to the processing module of the first module group. Thus the successive wafers are delivered alternately to the first and the second module groups.

REFERENCES:
patent: 7245348 (2007-07-01), Akimoto et al.
patent: 7255747 (2007-08-01), Ishikawa et al.
patent: 7281869 (2007-10-01), Akimoto et al.
patent: 2006/0213052 (2006-09-01), Matsuoka et al.
patent: 2007/0056514 (2007-03-01), Akimoto et al.
patent: 05-267148 (1993-10-01), None
patent: 2004-356560 (2004-12-01), None
patent: 2006-229184 (2006-08-01), None
Japanese Office Action issued on Apr. 23, 2011 for Application No. 2006-250747 w/ English language translation.

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