Wet process for removing specific component from gas

Details Wet process for removing specific component from gas Wet process for removing specific component from gas

1978-06-13

1980-01-15

Thomas, Earl C.

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

4232155, 423235, 423238, 423242, 55 68, 55 73, 55 90, B01D 5334

Patent

active

041839021

ABSTRACT:
Disclosed is a wet process for efficiently and economically removing a specific gas component and/or solid component from a gas containing the same wherein the gas is countercurrently contacted with a scrubbing liquid in a perforated or grid plate column without weir and downcomer and having a free-space ratio of 0.30 to 0.60 under the conditions of a superficial gas velocity of from 1.5 to 8 m/sec and a liquid flow rate of from more than 110,000 to 250,000 kg/m.sup.2 .multidot. hr.

REFERENCES:
patent: 194299 (1877-08-01), Genth
patent: 3718731 (1973-02-01), Carlson et al.
patent: 3892837 (1975-07-01), Uchiyama et al.
patent: 3941572 (1976-03-01), Uchiyama et al.
patent: 3969482 (1976-07-01), Teller
patent: 4086324 (1978-04-01), Welty, Jr.
Varoczy, "A Systemic Correlation for Two-Phase Pressure Drop," Chemical Engineering Process Progress Symposium Series, vol. 62, No. 64, pp. 232-239.

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