Wet oxidation process utilizing dilution of oxygen

Liquid purification or separation – Processes – Including controlling process in response to a sensed condition

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210761, 162 31, 162 49, 422 2, 422 3, 422 10, C02F 102

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active

043849598

ABSTRACT:
A continuous process for wet oxidation of aqueous liquor containing combustible matter using oxygen or oxygen enriched gas. An inert diluent gas is injected into the aqueous liquor or reactor off-gas such that oxygen in the gas phase is diluted by the sum of generated water vapor, produced carbon dioxide and injected inert gas to a concentration less than required for spontaneous combustion at every location in the system having surfaces not continually exposed to a continuous liquid water phase.

REFERENCES:
patent: 3042489 (1962-07-01), Schoeffel
patent: 3097988 (1963-07-01), Schoeffel
patent: 3272739 (1966-09-01), Earle et al.
patent: 3654070 (1972-04-01), Pradt et al.
patent: 4013560 (1977-03-01), Pradt
patent: 4191012 (1980-03-01), Stoddard et al.
F. E. Littman & F. M. Church, Final Report: Reactions of Titanium with Water and Aqueous Solutions, Stanford Research Institute Project No. SD-2116, Jun. 15, 1958.
David L. Pippen, Jack Stradling and Gene W. Frye, Safety Considerations Regarding the Use of High Pressure Oxygen, NASA, White Sands Facility Johnson Space Center, Sep. 1979.

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