Wet etching apparatus

Details Wet etching apparatus Wet etching apparatus

2007-01-02

2007-01-02

Hassanzadeh, Parviz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

For liquid etchant

Reexamination Certificate

active

10740111

ABSTRACT:
A wet etching apparatus is disclosed. The apparatus comprises a first tank, containing a first wet etching solution; a filter, having a filter cartridge, connected to the first tank to filter out the impurities in the first solution; a second etching tank, connected to the filter and the first tank in parallel, containing a second solution; a reaction tank, connected to the filter, wherein having a wet etching reaction; an exhaust component, connected to the filter and the reaction tank in parallel; a first pump, delivering the first solution to the reaction tank through the filter; and a second pump, delivering the second solution to the exhaust component to exhaust the solution from the etching tank through the filter.

REFERENCES:
patent: 4784169 (1988-11-01), Striedieck
patent: 4804464 (1989-02-01), Schevey
patent: 6054059 (2000-04-01), Latimer et al.
patent: 2003/0052068 (2003-03-01), Lu
patent: 2005/0023194 (2005-02-01), Petersen et al.

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