Wet/dry substrate processing apparatus

Details Wet/dry substrate processing apparatus Wet/dry substrate processing apparatus

1997-11-07

2000-06-20

Graybill, David E.

Metal working

Barrier layer or semiconductor device making

20429825, H01L 2100, H01L 2164, C23C 1400, C23C 900

Patent

active

060773219

ABSTRACT:
A buffer chamber is provided between a transfer chamber and a cleaning/drying chamber, and completely-closable shutters are provided between the transfer chamber and the buffer chamber as well as between the buffer chamber and the cleaning/drying chamber. The cleaning/drying chamber serving as a composite processing part including a processing in the wet atmosphere is connected with the remaining chambers of dry atmospheres.

REFERENCES:
patent: 4917556 (1990-04-01), Stark et al.
patent: 4951601 (1990-08-01), Maydan et al.

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