Wet cleans for composite surfaces

Details Wet cleans for composite surfaces Wet cleans for composite surfaces

1999-08-12

2000-08-08

Cintins, Ivars

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 3, B08B 312, B08B 704

Patent

active

060986395

ABSTRACT:
A composite surface at which at least two materials having different isoelectric points are exposed is cleaned by an HF dip, followed immediately by a dip in a low pH surfactant, followed by an optional rinse in deionized water, followed by a dip in ammonium hydroxide, followed immediately by a dip in a high pH surfactant, and followed by a rinse in deionized water. By maintaining the relatively extreme pH levels of the immediately preceding steps, the surfactant dips significantly prevent the formation of a charge differential between the different portions of the composite surface, which charge differential would otherwise tend to cause any particles present to remain on one portion of the composite surface or the other. The surfactant properties of surfactant dips help remove any particles from the composite surface, resulting in substantial removal of particles from the composite surface.

REFERENCES:
patent: 3597667 (1971-08-01), Horn
patent: 4817652 (1989-04-01), Liu et al.
patent: 5259888 (1993-11-01), McCoy
patent: 5944906 (1999-08-01), Robinson

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