Wet chemical emitter tip treatment

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...

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510300, 510330, 510410, 510728, 216 13, 216103, 216104, 216108, 216109, E03C 2300

Patent

active

058534920

ABSTRACT:
A wet chemical process is provided for treating an emitter formed on a substrate of a field emission display, the process comprises applying a solution including hydrogen to the emitter. In one embodiment of the invention, the steps of applying a solution comprises applying a solution of hydrofluoric acid to the emitter.

REFERENCES:
patent: 3592773 (1971-07-01), Muller
patent: 5646095 (1997-07-01), Eidelloth et al.
Cade et al. 1989, IEEE Transactions on Electron Devices, vol. 36 No. 11, pp. 2709-2714.
Spierings, 1993, J. Material Science, vol. 28, No. 3, pp. 6261-6273.

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