Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Reexamination Certificate
2005-09-27
2005-09-27
Bos, Steven (Department: 1754)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
C423S339000
Reexamination Certificate
active
06949234
ABSTRACT:
A new method of silane abatement is achieved. The novel silane abatement system comprises a water-filled chamber within an outer chamber. An air intake is located in one upper portion of said outer chamber and an exhaust output is located in another upper portion of the outer chamber. A silane gas intake pipe runs into the outer chamber and has its output under water in the water-filled chamber. A drain is connected through a valve at a bottom portion of the water-filled chamber. Many safety features are built into the wet abatement system, including temperature and water level sensors, water sprinklers, and means for shutting off air supply, exhaust, and silane intake. Waste silane gas is bubbled into a water-filled chamber. The waste silane gas is reacted with oxygen in water in the water-filled chamber whereby SiO2precipitates are formed and wherein the SiO2precipitates settle to a bottom surface of the water-filled chamber. The SiO2precipitates are drained out of the water-filled chamber to complete the abatement process.
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Chee Chong Peng
Tong Lee Kok
Ackerman Stephen B.
Bos Steven
Chartered Semiconductor Manufacturing Ltd.
Pike Rosemary L. S.
Saile George O.
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