Well treatment

Details Well treatment Well treatment

1996-02-28

1999-10-12

Suchfield, George A.

Wells

Processes

Material placed in pores of formation to treat resident...

166280, 166902, 507902, 507924, E21B 4102, E21B 43267

Patent

active

059642912

ABSTRACT:
Chemical treatment agents are supplied to a well or borehole extending through an earth formation by subjecting the well to a fracturing treatment with a high pressure fluid and proppant particles. The proppant particles are thereby trapped in fractures in the earth formation. Some or all of the proppant particles are of porous insoluble inorganic material, and are impregnated with a chemical treatment agent, such as a scale inhibitor or a corrosion inhibitor. The porous particles may be of a ceramic or oxide material, for example a silica and/or an alumina-based material.

REFERENCES:
patent: 2760584 (1956-08-01), Rohrback
patent: 2879847 (1959-03-01), Irwin
patent: 3072192 (1963-01-01), Van Poollen
patent: 3179170 (1965-04-01), Burtch
patent: 3199591 (1965-08-01), Keplet
patent: 3283817 (1966-11-01), Roberts
patent: 3531409 (1970-09-01), Seffens et al.
patent: 3756949 (1973-09-01), Schreurs
patent: 3782469 (1974-01-01), Fulford
patent: 4291763 (1981-09-01), Singer
patent: 4456067 (1984-06-01), Pinner
patent: 4660645 (1987-04-01), Newlove
patent: 4670166 (1987-06-01), McDougall
patent: 5196124 (1993-03-01), Connor et al.
patent: 5322121 (1994-06-01), Hrachovy
R.J. Powell et al, "SPE 28999 Controlled-Release Scale Inhibitor for Use in Fracturing Treatments," 1995, Society of Petroleum Engineers; SPE International; pp. 571-579.
Derwent Database WPI, AN 94-158056, Week 9419, relating to SU 1,799,893.

Affiliated with

Also associated with

Rating

Well treatment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Well treatment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Well treatment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-645346