Well isolation bipolar transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Bipolar transistor structure – With non-planar semiconductor surface

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257587, 257588, 438361, 438339, H01L 27082, H01L 27102, H01L 2970, H01L 3111

Patent

active

061147435

ABSTRACT:
The present invention relates to an integrated circuit including a lateral well isolation bipolar transistor. A first portion of the upper internal periphery of the insulating well is hollowed and filled with polysilicon having the same conductivity type as the transistor base, to form a base contacting region. A second portion of the upper internal periphery of the insulating well is hollowed and filled with polysilicon having the same conductivity type as the transistor emitter, to form an emitter contacting region.

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French Search Report from French Patent Application 96 15389, filed Dec. 10, 1996.
Patent Abstracts of Japan, vol. 015, No. 114 (E-1047), Mar. 19, 1991 & JP-A-03 004538 (Toshiba Corp.).

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