Weak base developable positive photoresist composition containin

Details Weak base developable positive photoresist composition containin Weak base developable positive photoresist composition containin

1995-10-25

1997-07-08

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430 7, 430165, 430193, G03F 7023

Patent

active

056459700

ABSTRACT:
A positive photoresist composition is disclosed which comprises a photosensitive compound, a phenolic resin, and an organic solvent. The phenolic resin is prepared from a monomeric composition comprises formaldehyde and a mixture of phenol monomers. The mixture of phenol monomers comprises: (a) no more than 98 mole percent of a mixture of monohydroxy phenols, the mixture of monohydroxy phenols comprises: (I) about 50.about.80 mole percent of meta-methylphenol; (ii) about 10.about.30 mole percent of 2,5-dimethylphenol; and (iii) about 10.about.40 mole percent of 2,3,5-trimethylphenol; and (b) at least 2 mol percent of at least one polyhydroxybenzene which is presented by the following formula: ##STR1## wherein n is an integer of 1 or 2. Preferably, the polyhydroxybenzene is a mixture of trihydroxybenzene and dihydroxybenzene in a molar ratio of about 40 to 60. The photoresist composition can be developed using a weak basic solution which causes images of sharp contrast to be developed; it can also be advantageously used in making color filters for use in color liquid crystal displays in a multiple development process in conjunction with an electrodeposition lithography.

REFERENCES:
patent: 3046118 (1962-07-01), Schmidt et al.
patent: 3148983 (1964-09-01), Endermann et al.
patent: 3402044 (1968-09-01), Steinhaff et al.
patent: 4115128 (1978-09-01), Kita
patent: 4173470 (1979-11-01), Fahrenholtz
patent: 4551409 (1985-11-01), Gulla et al.
patent: 4719167 (1988-01-01), Miura et al.
patent: 4971887 (1990-11-01), Schmitt et al.
patent: 5087548 (1992-02-01), Hosaka et al.
patent: 5214541 (1993-05-01), Yamasita et al.
patent: 5214542 (1993-05-01), Yamasita et al.
patent: 5322757 (1994-06-01), Ebersole
patent: 5324620 (1994-06-01), Ebersole

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