Wavefront measuring method and wavefront measuring apparatus...

Optics: measuring and testing – By light interference

Reexamination Certificate

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C382S191000, C382S207000

Reexamination Certificate

active

08077320

ABSTRACT:
A wavefront measuring method includes steps of:obtaining a first transmitted-wavefront from a first image formed by transmitting beam through a substance at a first angle; obtaining a second image formed by transmitting the beam through the substance at a second angle; formulating a mask corresponding to an interference degree of the second image; converting the first transmitted-wavefront to match with a temporary second transmitted-wavefront from the second image; and unwrapping from the second image, the mask, and a converted first transmitted-wavefront to obtain a second transmitted-wavefront by transmitting the beam through the substance at the second angle.

REFERENCES:
patent: 5185810 (1993-02-01), Freischlad
patent: 6859566 (2005-02-01), Sun
patent: 7044602 (2006-05-01), Chernyak
patent: 3423486 (2003-07-01), None
Ghiglia Pritt Two-Dimensional Phase Unwrapping Theory, Algorithms, and Software.

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