Wavefront characterization and correction

Details Wavefront characterization and correction Wavefront characterization and correction

2011-08-30

2011-08-30

Toatley, Gregory J (Department: 2877)

Optics: measuring and testing

Lamp beam direction or pattern

C351S205000, C351S214000, C356S497000, C356S618000

Reexamination Certificate

active

08009280

ABSTRACT:
A system, for determining characteristics of a beam wavefront and reshaping such wavefront, including: apparatus for sampling the wavefront curvature and generating outputs; apparatus for reshaping the wavefront; and apparatus for receiving the outputs, proportioning the outputs to match the inputs need to drive controls for the reshaping apparatus, and sending the proportioned outputs to the reshaping apparatus. The reshaping apparatus is, preferably, a deformable mirror. The sampling apparatus includes a distorted grating. The method includes: positioning the sampling apparatus in the bean path; positioning a reshaping apparatus in the beam path; sampling the curvature of the wavefront and generating outputs representative of the curvature thereof; sending the generated outputs to the proportioning apparatus; proportioning the outputs to match the inputs needed to drive the controls of the reshaping apparatus; and sending the proportioned outputs to the reshaping apparatus to change the shape thereof.

REFERENCES:
patent: 6286959 (2001-09-01), Otten
patent: 6331059 (2001-12-01), Kudryashov et al.
patent: 6736507 (2004-05-01), Kudryashov et al.
patent: 7232999 (2007-06-01), Otten et al.
patent: 7780294 (2010-08-01), Dai

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