Optical: systems and elements – Diffraction – From grating
Reexamination Certificate
2009-02-24
2011-12-13
Lee, Hwa (Department: 2886)
Optical: systems and elements
Diffraction
From grating
C356S499000
Reexamination Certificate
active
08077391
ABSTRACT:
A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.
REFERENCES:
patent: 7081962 (2006-07-01), Nakauchi
patent: 2004/0070740 (2004-04-01), Irie
patent: 2006-332586 (2006-12-01), None
patent: 2006/115292 (2006-11-01), None
Hasegawa Masanobu
Kato Seima
Ouchi Chidane
Canon Kabushiki Kaisha
Lee Hwa
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