Optics: measuring and testing – Lamp beam direction or pattern
Reexamination Certificate
2005-12-13
2005-12-13
Font, Frank G. (Department: 2877)
Optics: measuring and testing
Lamp beam direction or pattern
C356S124500, C356S125000, C355S053000
Reexamination Certificate
active
06975387
ABSTRACT:
Before measuring a wavefront aberration of a projection optical system, an image formation position of an image of a pattern of a test reticle which is formed on a predetermined surface is detected by an AF sensor. Based on a result of this detection, the position of an incident surface of a wavefront aberration measurement unit is adjusted, and a position of an image of the pattern with respect to the incident surface is adjusted. After this adjustment, the image of the pattern formed through the projection optical system is detected by the wavefront aberration measurement unit, and a wavefront aberration detection section is used to obtain wavefront aberration information of the projection optical system based on a result of this detection.
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Font Frank G.
Nguyen Sang H.
Nikon Corporation
Synnestvedt & Lechner LLP
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