Wavefront-aberration measuring device and exposure apparatus...

Details Wavefront-aberration measuring device and exposure apparatus... Wavefront-aberration measuring device and exposure apparatus...

2009-03-23

2010-06-29

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

07746479

ABSTRACT:
A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing through the optical system without removing information about the wavefront aberration of the optical system, and the second to fourth openings transmit components of the light passing through the optical system having the information about the wavefront aberration of the optical system removed.

REFERENCES:
patent: 6111646 (2000-08-01), Naulleau et al.
patent: 6307635 (2001-10-01), Goldberg
patent: 2003/0025908 (2003-02-01), Taniguchi et al.

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