Wavefront-aberration measuring device and exposure apparatus...

Optics: measuring and testing – By light interference – For dimensional measurement

Reexamination Certificate

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Details

C356S521000

Reexamination Certificate

active

07623247

ABSTRACT:
A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing through the optical system without removing information about the wavefront aberration of the optical system, and the second to fourth openings transmit components of the light passing through the optical system having the information about the wavefront aberration of the optical system removed.

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patent: WO2004/005846 (2004-01-01), None

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