Waveform generator for microdeposition control system

Details Waveform generator for microdeposition control system Waveform generator for microdeposition control system

2002-05-31

2008-11-11

Koch, III, George R (Department: 1791)

Coating apparatus

Control means responsive to a randomly occurring sensed...

Condition of coated material

C118S669000, C118S699000, C427S427200, C347S009000, C347S010000, C347S011000, C347S012000, C347S013000

Reexamination Certificate

active

07449070

ABSTRACT:
A microdeposition system (20) and method includes a head with a plurality of nozzles (230). A controller (22) generates nozzle firing commands that selectively fire the nozzles to create a desired feature pattern. Configuration memory stores voltage waveform parameters that define a voltage waveform (280) for each of the nozzles. A digital to analog converter (DAC) sequencer communicates with the configuration memory and the controller and outputs a first voltage waveform for a first nozzle when a nozzle firing command for the first nozzle is received from the controller (22). A resistive ladder DAC receives the voltage waveforms from the DAC sequencer. An operational amplifier (opamp) communicates with the resistive ladder DAC and amplifies the voltage waveforms. The nozzles fire droplets when the voltage waveforms received from the opamp exceed a firing threshold of the nozzle (230).

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