Waveflux concentration reflector

Illumination – Light modifier – Reflector

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Details

362278, 362303, F21V 700

Patent

active

041745337

ABSTRACT:
In a structure comprising a first, through-shaped reflector and a second reflector consisting of two parabolic portions derived from a parabola of which the axis forms a certain angle with the main axis of waveflux emission of the device, the two parabolic portions are so shaped and disposed as to have a certain symmetry in relation to the main axis of the emergent beam, so that a secondary emission can be obtained in a privileged direction other than that of the main beam axis.

REFERENCES:
patent: 2755374 (1956-07-01), Ott et al.
patent: 3609340 (1971-09-01), Habro
patent: 4006355 (1977-02-01), Shemitz et al.
patent: 4034217 (1977-07-01), Dumont

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