Wave front aberration measuring apparatus

Details Wave front aberration measuring apparatus Wave front aberration measuring apparatus

1990-08-29

1992-10-20

Turner, Samuel A.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356345, G01B 902

Patent

active

051574594

ABSTRACT:
An apparatus for measuring a wave front aberration including a light beam splitter for dividing a parallel laser light beam incident from a measuring object into two beam fluxes, an image rotator disposed in at least one optical path of the divided beam fluxes for rotating the wave from on the optical axis, an interference device for interfering, after superposing the beam fluxes, whose wave fronts are rotated relatively, an imaging lens for forming the interfered beam into an image, and an observation device for observing the imaged interference fringes.

REFERENCES:
patent: 4355871 (1982-10-01), Nevyas et al.
patent: 4379633 (1983-04-01), Bickel et al.
patent: 4553229 (1985-11-01), Wakamiya
patent: 4660978 (1987-04-01), Wu
Copy of the English Language abstract for Japanese Patent No. 61-109015.
Copy of the Hitachi Central Research Article 13a-E-5.
Copy of the Matsushita Denki Central Research Institute Article 13p-E-10.
Copy of the Hitachi Central Research Article 13p-E-12.
Copy of the Optical Shop Testings, pp. 165-172.

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