Wave filter and process for making same

Details Wave filter and process for making same Wave filter and process for making same

1976-01-30

1978-07-25

Smith, Alfred E.

Wave transmission lines and networks

Automatically controlled systems

With control of equalizer and/or delay network

29 2535, 310340, H03H 904, H03H 910, H03H 920, H01L 4122

Patent

active

041032640

ABSTRACT:
In the manufacture of wave filters, such as FM filters, polarized piezoelectrically responsive wafers are provided, temporarily, on the active regions thereof, with a removable material. Subsequent to the encapsulation of the wafer by a protective but porous coating, the filter is heated and the removable material sublimates through the porous coating establishing a wafer surface substantially free of residual impurities and leaving an uninterrupted cavity between the wafer and the coating in the active regions. The preferred sublimatable material is paradichlorobenzene.

REFERENCES:
patent: 3209178 (1965-09-01), Koneval
patent: 3650003 (1972-03-01), Toyoshima
patent: 3676724 (1972-07-01), Berlincourt et al.
patent: 3747176 (1973-07-01), Toyoshima
patent: 4017752 (1977-04-01), Kakehi et al.
Dummer et al.--"Miniature and Microminiature Electronics", John Wiley & Sons, 1961; pp. 143-145 and Title page.

Affiliated with

Also associated with

Rating

Wave filter and process for making same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wave filter and process for making same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wave filter and process for making same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1424490