Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Diazo-type process – i.e. – producing dye image by reacting...
Patent
1984-08-20
1985-01-22
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Diazo-type process, i.e., producing dye image by reacting...
430148, 430169, 430176, 430179, G03C 160, G03C 534
Patent
active
044952694
ABSTRACT:
An aqueous diazo coating composition is disclosed to be used in accordance with an alkaline vapor development system, containing a hydrolyzed resin together with a diazo light-sensitive compound, coupling agent and stabilizing materials. The aqueous diazo coating composition of the present invention provides a method of fabricating a light-sensitive diazo member for use in combination with a development system utilizing alkaline vapors which excludes the use of organic solvents.
REFERENCES:
patent: 2405523 (1946-08-01), Sease et al.
patent: 2822271 (1958-02-01), Krieger
patent: 2822272 (1958-02-01), Kosalek et al.
patent: 3100150 (1963-08-01), Chismar et al.
patent: 3353984 (1967-11-01), Landau
patent: 4275137 (1981-06-01), Verhoof
patent: 4471043 (1984-09-01), Van de Vorle
Anon, "Cymel 303", Proprietary Literature from American Cyanamide.
Bialczak Edward C.
Chernovitz John J.
AM International Inc.
Bowers Jr. Charles L.
Camasto Nicholas A.
Kolasch Donald C.
LandOfFree
Waterborne two component diazo type coating composition with hyd does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Waterborne two component diazo type coating composition with hyd, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Waterborne two component diazo type coating composition with hyd will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-567124