Water vapor, reaction rate and deposition rate control of tin ox

Details Water vapor, reaction rate and deposition rate control of tin ox Water vapor, reaction rate and deposition rate control of tin ox

1984-12-28

1986-05-20

Hoffman, James R.

Coating processes

Electrical product produced

Transparent base

65 6052, 427160, 427166, C03C 17245, B05D 512

Patent

active

045900965

ABSTRACT:
A chemical vapor deposition method for forming fluorine-doped tin oxide coatings uses a liquid coating composition which includes an organic fluorine dopant and an organotin compound. In the method, the gas stream contains sufficient water vapor such that its relative humidity at 18.degree. C. is about 6% to 100%. A preferred liquid coating composition is monobutyltin trichloride and trifluoroacetic acid.

REFERENCES:
patent: 4265974 (1981-05-01), Gordon
patent: 4293594 (1981-10-01), Toldas et al.

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