Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2007-01-09
2007-01-09
Mruk, Brian P (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S248000, C510S253000, C510S254000, C510S257000, C510S263000, C510S264000, C510S269000, C510S492000, C510S499000, C510S501000
Reexamination Certificate
active
10434900
ABSTRACT:
A method for chemical etching is disclosed for taking away oxidized film and removing cut as well as punched edge burs of harden-treated carbon steel (SK3, SK4 and SK5). Thereby, the fillet edge of the cut section is achieved. An oxidized film with a thickness of several micrometers is formed when a cut and punched steel is quenched and tempered at high temperature. Due to high strength and hardness of the steel, the oxidized film and edge burs are difficult to be removed by mechanical grinding. Therefore, a suitable electrolyte composes of only a little chemical reagent and oxidizer in deionized water is used to remove the oxidized film and punched bur simultaneously using chemical etching method.
REFERENCES:
patent: 3954645 (1976-05-01), Otrhalek et al.
patent: 2004/0211441 (2004-10-01), Huang et al.
patent: 1 407 269 (1975-09-01), None
patent: 48-52638 (1973-07-01), None
Hsu Chun-Ching
Huang Ching-An
Chang Gung University
Mruk Brian P
Rosenberg , Klein & Lee
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