Water soluble photosensitive resin compositions with bisazide co

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430167, 430194, 430325, G03C 160, G03C 172

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active

048429848

ABSTRACT:
A novel photosensitive resin composition, which has fairly high sensitivity to light and developable with water comprising of essential components a resin represented by the general formula (I), ##STR1## wherein X, which may be present or absent, represents acetic acid when present, Y stands for a group containing carbon-carbon double bond(s) represented by the formula (II), ##STR2## n is an integer of 10 or greater, more than 0 and less than 1, and t is 0 or 1, and a sodium or potassium salt of 4,4'-diazidostilbene-2,2'-disulfonic acid represented by the general formula (IV), ##STR3## wherein z stands for sodium atom or potassium atom; or the resin represented by the general formula (I), the sodium or potassium salt of 4,4'-diazidostilbene-2,2'-disulfonic acid represented by the general formula (IV), and an aromatic ketone represented by the general formula (V), ##STR4## wherein G stands for hydrogen atom or an amino group or dialkylamino group represented by the general formula (VI), ##STR5## where u is 0, 1 or 2.

REFERENCES:
patent: 2848328 (1958-08-01), Hepher
patent: 4097283 (1978-06-01), Asano et al.
patent: 4540650 (1985-09-01), Klug et al.
patent: 4614701 (1986-09-01), Mori et al.
patent: 4687727 (1987-08-01), Toyama et al.
patent: 4701497 (1987-10-01), Serizawa et al.
patent: 4778725 (1988-10-01), Serizawa et al.

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